Wafer-scale bioactive substrate patterning by chemical lift-off lithography

• Chong-You Chen,
• Chang-Ming Wang,
• Hsiang-Hua Li,
• Hong-Hseng Chan and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2018, 9, 311–320, doi:10.3762/bjnano.9.31

• well-tunable pattern feature dimension and geometry, great local molecular environment control, and wafer-scale fabrication characteristics, this chemical lift-off process has advanced conventional bioactive substrate fabrication into a more convenient route. Keywords: bioactive substrate; chemical

• fact that optical lithography allows for large-area fabrication provides an accessible route to bioactive substrate manufacturing but is limited by light diffraction when very fine control is required. On the other hand, scanning beam-based lithographic techniques allow for highly controllable fine

• interaction, but also lower non-specific binding of objects. A highly controllable molecular manipulation over large area surfaces is consequently highly sought after in bioactive substrate fabrication. The recently developed chemical lift-off lithography (CLL) technique is a straightforward approach to